Samsung announces their 11nm LPP and 7nm LPP process nodes
Samsung plans to start using EUV in mid 2018!
Published: 11th September 2017 | Source: Samsung - Press Release |
Samsung announces their 11nm LPP and 7nm LPP process nodes
7LPP (7nm Low Power Plus): 7LPP will be the first semiconductor process technology to use an EUV lithography solution. 250W of maximum EUV source power, which is the most important milestone for EUV insertion into high volume production, was developed by the collaborative efforts of Samsung and ASML. EUV lithography deployment will break the barriers of Moore’s law scaling, paving the way for single nanometer semiconductor technology generations.
More details on these new process nodes are expected to be released later this month at the Samsung Foundry Forum Japan on September 15th.
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Most Recent Comments
250watts maximum out of 7nm for them? Well... I think AMD is out of that race for 7nm then for their gpus
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The wattage indicates the number of photons that are exposed to the wafer at any given time. Energy is measured in watts, so a 250W EUV source can deliver 250 Watts worth of photons to the silicon wafer per second.
Long story short the higher wattage the EUV equipment the faster each silicon wafer is produced. The fact that they couldn't create EUV tech that is this powerful before has prevented the tech from being used before now.Quote