Samsung details their 7nm EUV manufacturing process

Samsung details their 7nm EUV manufacturing process

Samsung details their 7nm EUV manufacturing process

Next-generation process nodes are always a hot topic of discussion within the PC industry, as they can often be just as impactful on the designs of both CPUs and GPUs as underlying architectural changes. The move to a new process node always offers a significant leap in either efficiency or performance, particularly when a major node shift occurs. 

Samsung has officially revealed some details on their upcoming 7nm LPP (Low Power Plus) EUV semiconductor process technology, the company’s first manufacturing process to make use of Extreme Ultraviolet (EUV) lithography equipment. These tools will help manufacturers break through the barriers that are preventing Moore’s law from scaling onward, while also decreasing the complexity of existing ultra compact 7nm processes. 

Qualcomm has already confirmed that they plan to use Samsung’s 7nm EUV lithography to create Snapdragon 5G mobile chipsets, which is great news for Samsung’s future foundry prospects. When compared to Samsung’s 10nm process technology 7nm EUV offers a 40% increase in area efficiency, 10% higher performance or up to 35% lower power consumption. 7nm has the potential to be smaller, faster and more efficient.  

Samsung details their 7nm EUV manufacturing process  

One of the major benefits of EUV right now is its ability to improve the accuracy of lithography equipment, which is why other foundries are looking to upgrade their existing 7nm processes with EUV technology. This accuracy can increase silicon yields by decreasing the complexity of the node, reducing the need for intricate quadruple patterning techniques and other risky processes. 

EUV technology will allow the industry to continue creating smaller and more complex process technologies, allowing the industry to scale past 7nm, where the limits of existing DUV (Deep Ultra Violet) are evident. 

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